Japan, Jan. 20 -- BOEING CO has got intellectual property rights for 'COMPOSITE SPARS WITH INTEGRATED SACRIFICIAL SURFACES.' Other related details are as follows: Application Number: JP,2021-174539 ... Read More
Japan, Jan. 20 -- KAO CORP has got intellectual property rights for 'AQUEOUS PIGMENT DISPERSION.' Other related details are as follows: Application Number: JP,2021-212965 Category (FI): C09D11/322,B... Read More
Japan, Jan. 20 -- FUKUDA DENSHI CO LTD has got intellectual property rights for 'HOLTER ELECTROCARDIOGRAM RECORDING DEVICE, MEDICAL SYSTEM, AND SETTING INFORMATION SHARING METHOD IN HOLTER ELECTROCARD... Read More
Japan, Jan. 20 -- ENEOS CORP has got intellectual property rights for 'CATALYST, CATALYST SYSTEM AND METHOD FOR PRODUCING CATALYST.' Other related details are as follows: Application Number: JP,2020-... Read More
Japan, Jan. 20 -- HAMAMATSU PHOTONICS KK has got intellectual property rights for 'ACTIVE ENERGY IRRADIATION EQUIPMENT.' Other related details are as follows: Application Number: JP,2020-215352 Cate... Read More
Japan, Jan. 20 -- KOBAYASHI PHARMACEUTICAL CO LTD has got intellectual property rights for 'ORAL COMPOSITION.' Other related details are as follows: Application Number: JP,2020-213487 Category (FI):... Read More
Japan, Jan. 20 -- KRATON POLYMERS RESEARCH BV has got intellectual property rights for 'METAL-WORKING FLUID COMPOSITION AND PRODUCTION METHOD.' Other related details are as follows: Application Numbe... Read More
Japan, Jan. 20 -- TAIHEIYO CEMENT CORP has got intellectual property rights for 'CEMENT CLINKER PRODUCTION SYSTEM.' Other related details are as follows: Application Number: JP,2020-208955 Category ... Read More
Japan, Jan. 20 -- AURORA FLIGHT SCIENCES CORP has got intellectual property rights for 'AIRCRAFT SENSOR SYSTEM SYNCHRONIZATION.' Other related details are as follows: Application Number: JP,2021-2022... Read More
Japan, Jan. 20 -- SUMITOMO CHEMICAL CO LTD has got intellectual property rights for 'SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN.' Other related details are as fo... Read More